STRIVE high school students visit campus, shadow RLC faculty

INA, Ill. (Nov. 13, 2014) - Several students from the STRIVE program through Mt. Vernon Township High School (MVTHS) visited Rend Lake College’s Ina campus and Studio RLC cosmetology program in Mt. Vernon this morning as a part of a job shadowing program.

The STRIVE Program, sponsored by the two Rotary Clubs in Mt. Vernon and the RLC Foundation, is designed to encourage seniors to improve on grades and attendance during their last year. Two students who have the best improvement in grades and attendance are awarded one-year full scholarships to RLC through the Foundation, said RLCF CEO Shawna Bullard.

MVTHS students, FROM RIGHT, Daiandre Gladney, Keagan Myers, and Brandon Ellis, get up close with Rend Lake College's CNC Machine during their visit Thursday morning. Matt Jackson, LEFT, Illinois Green Economy Network Curriculum Coordinator at RLC, showed the trio several pieces of equipment RLC students use in Applied Science and Technology programs. Click on the image for a larger view.
(ReAnne Palmer / RLC Public Information)

“The STRIVE students did the job shadowing with the help of the Rotary Clubs, the Jefferson County Chamber of Commerce, and the Foundation. It’s the first time we’ve done this activity, and there will be about 55 to 60 students all over the county participating,” said Bullard. “We’re fortunate to have students coming to our campus who are interested in the unique Cosmetology and Applied Science and Technology programs we have, and we hope to be able to encourage them to continue their education after high school.”

Students from all over Jefferson County participated, including those from MVTHS, Waltonville High School, Webber Township High School, and Woodlawn High School. After the job shadowing in the morning, Crossroads Community Hospital sponsored a lunch for the students before they returned to school.

For more information about the STRIVE program, contact the RLC Foundation at 618-437-5321, Ext. 1214 or foundation@rlc.edu.